TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
Huawei has confirmed in a posting on its website reports about its breakthrough in making a light source component used in EUV lithography systems which are required for making high-end processors on ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
MUNICH, Germany — Suss MicroTec Test Systems GmbH today announced it has extended the use of low-cost 1:1 full-field lithography tools to sub-micron production steps using a breakthrough mask ...
LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...
Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
ACM Research, Inc. previously announced the delivery of its first Ultra Lith BK lithography system to a leading global display panel manufacturer, featuring ultraviolet curing uniformity of ±5% and ...
2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
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